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Ultra-High Purity & Insulation: 99.5%-99.99% Al₂O₃ grade, volume resistivity >10¹⁴ Ω·cm, ideal for high-voltage insulation in ICP etchers and ion implanters .
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Extreme Plasma Resistance: Outperforms quartz in Cl₂/CF₄ plasma environments, reducing replacement frequency by 60% and lowering maintenance costs .
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Thermal Stability: Withstands up to 1600°C, thermal expansion coefficient (7-8×10⁻⁶/°C) perfectly matches silicon wafers, eliminating thermal stress failures .
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Class 1 Cleanroom Compliance: Mirror-finish surface (Ra < 0.01μm) with minimal particle release, safe for direct wafer contact components .
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