| 材料: | 高純度アルミナセラミック (Al2O3 ≥ 99.8%) | 表面平坦度: | ≤ 0.003 mm (3 μm) |
|---|---|---|---|
| 平行度: | ≤ 0.003 mm (3 μm) | かさ密度: | ≥ 3.92 g/cm3 |
| 硬度: | 1550 HV1 / 91 HRA | 絶縁耐力: | 25kV/mm |
| 最大動作温度: | 1400℃ (連続) / 1600℃ (短期ピーク) | 表面粗さ: | Ra0.2μm~Ra0.4μm |
| 耐薬品性および耐プラズマ性: | CF4、CHF3、SF6、Cl2、BCl3 プラズマに対する耐性 | 機械加工能力: | 5軸CNCフライス加工、同心ラビリンス溝、ザグリ穴 |
Precision Advanced Ceramics — Custom Semiconductor Plasma Etch Focus Ring & Pedestal Base Specialist Over a decade of dedicated expertise in high-purity advanced technical ceramics. Delivering high-precision engineered ceramic components for global semiconductor fabrication, wafer etching equipment, and precision vacuum systems. Product Overview Specification Table Summary : Alumina Purity: ≥ 99.8% (Al2O3) Bulk Density: ≥ 3.92 g/cm³ Surface Flatness: ≤ 0.003 mm (3 μm, Laser